Our group is now focusing on the scientific research and industrial applications of advanced carbon-based films and plasma based surface modification technologies. Till now, we have established the hybrid R&D platforms including substrate pre-treatment, film deposition, structure characterization and industrial application for the advanced carbon-based thin films( such as a-C:H, ta-C, Me-DLC), the novel super-hard films ( such as TiAlN, TiAlSiN, CrAlNC etc.) , and solid lubricant films ( GLC, MoS2, etc.) . Various PVD and CVD technologies including ion beams, magnetron sputtering, filtering cathodic vacuum arc, PECVD, novel HIPIMS, as well as the related hybrid PVD methods have been developed. In order to obtain the deep insight into the mechanism and relationships between film structure and properties, furthermore, atomic-scale calculations based on first principle simulation and dynamic molecular simulation are ongoing with cooperated by Dr. Kwang-Ryeol Lee in Korea Institute Science and Technology ( KIST). In addition, we are also interested in exploring the deposition processes and fabrication systems for mass production to commercialize the industrial applications of films with high performance.